Atomera Incorporated (Nasdaq: ATOM):

This presentation will discuss using MST®-enabled (also referred to as “Oxygen-Inserted Silicon”) source engineering for gate-length scaling of low-voltage power switch devices. These results were demonstrated on silicon fabricated at an automotive-qualified foundry by shrinking the gate length of a baseline 5V analog MOSFET down to 0.25um, leading to a 100% increase in drive current compared to baseline devices. The result is the industry’s best RSP for both NMOS (< 0.8mOhm-mm2) and PMOS (1.8mOhm-mm2) switch devices, while maintaining all required device operations and reliability metrics. Atomera’s poster will highlight the benefits of MST integration in the channel for precise dopant diffusion control and electron mobility enhancements, and show how the team was able to successfully demonstrate the benefits of the MST-enabled channel source engineering for gate-length scaling of low-voltage power switch devices.

Follow Atomera:

Company website: https://atomera.com/

Atomera whitepaper: https://atomera.com/news-and-blogs/

Atomera blog: https://atomera.com/news-and-blogs/

LinkedIn: www.linkedin.com/company/atomera/

About Atomera

Atomera Incorporated, one of America’s top 100 Best Small Companies in 2022 ranked by Forbes, is a semiconductor materials and technology licensing company focused on deploying its proprietary, silicon-proven technology into the semiconductor industry. Atomera has developed Mears Silicon Technology™ (MST®), which increases performance and power efficiency in semiconductor transistors. MST can be implemented using equipment already deployed in semiconductor manufacturing facilities and is complementary to other nano-scaling technologies in the semiconductor industry roadmap. More information can be found at www.atomera.com.

View source version on businesswire.com: https://www.businesswire.com/news/home/20220519005399/en/